产品描述
设备名称：外延反应器
商品编号: 6EPIcds-epi-A7035
型号：EpiPro 5000
制造商：CSD Epitaxy
类别：半导体
特长:EpiPro 5000可使用触摸屏计算机界面轻松控制和编程。还可以通过触摸屏或连接打印机获得过程日志。询问如何定制软件以满足您公司的需求。
ADVANCED TECHNOLOGY
Patented Bell Jar Design
The EpiPro chamber features a patented, bell-jar design that provides uniform delivery of reactant gases over a large area. The bell jar design provides superior gas-flow dynamic and creates excellent deposit uniformity across the susceptor.
Dynamic Z-Motion
Dynamic Z- Motion of the susceptor minimises temperature gradient across the susceptors during heat-up. Real time adjustments of the Z-axis during heating, in combination with the susceptor rotation, improves the slip performance and the thickness and resistivity uniformity.
N2 or H2 Purged Coil
The purged coil enclosure of the EpiPro system isolates the coil assembly from the process chamber, thus reducing the deposition on the coil for extended life and improved serviceability.
Ex-Situ Temperature Measurement
An ex-situ fiber optic sensor measures temperature on the back side of the susceptor so that temperature repeatability is not affected by the deposition process. The ex-situ temperature measurement eliminates coating effect on the temperature measurement sensor, thus insuring excellent repeatability.
Low Frequency RF Power
To further improve temperature uniformity and to minimise slip, RF coupling to the susceptor has been dramatically enhanced by using an RF frequency of 25kHz. The low-frequency RF power provides better power coupling from the coil to the susceptor through deeper penetration of the RF into the susceptor, thus producing better uniformity.
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